A method of doping includes depositing a layer of dopant material on nonplanar and planar features of a substrate. Inert ions are generated from an inert feed gas. The inert ions are extracted towards the substrate where they physically knock the dopant material into both the planar and nonplanar features...http://www.google.de/patents/US7524743?utm_source=gb-gplus-sharePatent US7524743 - Conformal doping apparatus and method
