The plasma processing apparatus and plasma processing method of the present invention are suitable for the application of plasma processing to etching, ashing, CVD, etc. in the manufacturing of large scale integrated circuits (LSIs) and liquid crystal display panels (LCDs), and useful for the manufacturing...http://www.google.de/patents/US6092486?utm_source=gb-gplus-sharePatent US6092486 - Plasma processing apparatus and plasma processing method
