A plasma processing system and method for processing substrates such as by chemical vapor deposition or etching. The system includes a plasma processing chamber, a substrate support for supporting a substrate within the processing chamber, a dielectric member having an interior surface facing the substrate...http://www.google.de/patents/US6042687?utm_source=gb-gplus-sharePatent US6042687 - Method and apparatus for improving etch and deposition uniformity in plasma semiconductor processing
