An induction plasma source for integrated circuit fabrication includes a hemispherically shaped induction coil in an expanding spiral pattern about the vacuum chamber containing a semiconductor wafer supported by a platen. The windings of the induction coil follow the contour of a hemispherically shaped...http://www.google.de/patents/US5346578?utm_source=gb-gplus-sharePatent US5346578 - Induction plasma source
