Disclosed is a technique capable of reducing the manufacturing time of a photomask. In a method of transferring a predetermined pattern onto a semiconductor wafer by reduced projection exposure using a product mask manufactured by performing the reduced projection exposure to a pattern of an IP mask...http://www.google.de/patents/US20020102476?utm_source=gb-gplus-sharePatent US20020102476 - Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit device
