A method of forming (and an apparatus for forming) a metal oxide layer on a substrate, particularly a semiconductor substrate or substrate assembly, using a vapor deposition process and one or more precursor compounds that include diketonate ligands and/or ketoimine ligands....http://www.google.de/patents/US7648926?utm_source=gb-gplus-sharePatent US7648926 - Systems and methods for forming metal oxides using metal diketonates and/or ketoimines
