A microlithography projection apparatus comprises an illuminator, for supplying a beam of radiation for illuminating a pattern on a mask, and a projection system for forming an image of the illuminated portion of the mask on a resist-coated substrate. The image is projected off-axis with respect to the...http://www.google.de/patents/US20010012101?utm_source=gb-gplus-sharePatent US20010012101 - Microlithography projection apparatus
