A method to form a strain-inducing three-component epitaxial film is described. In one embodiment, the strain-inducing epitaxial film is formed by a multiple deposition/etch step sequence, followed by an amorphizing dopant impurity-implant and, finally, a kinetically-driven crystallization process. In...http://www.google.de/patents/US7678631?utm_source=gb-gplus-sharePatent US7678631 - Formation of strain-inducing films
