In order to process a carbon film carbon is deposited on a substrate by sputtering from a carbon sputter target in a gas mixture which contains nitrogen in a minimum proportion of 20% and a sputter gas at a predetermined gas pressure and the substrate is then subjected under a high vacuum to thermal...http://www.google.de/patents/US6136160?utm_source=gb-gplus-sharePatent US6136160 - Process for producing a carbon film on a substrate
