The invention in one embodiment is realized in a plasma reactor for processing a semiconductor workpiece. The reactor includes a vacuum chamber having a side wall and a ceiling, a workpiece support pedestal within the chamber and generally facing the ceiling, a gas inlet capable of supplying a process...http://www.google.de/patents/US20040083971?utm_source=gb-gplus-sharePatent US20040083971 - Plasma reactor having a symmetric parallel conductor coil antenna
