A new method is provided for the creation of STI regions. STI trenches are created in the surface of a substrate following conventional processing. A layer of STI oxide is deposited and, using an exposure mask that is a reverse mask of the mask that is used to create the STI pattern, impurity implants...http://www.google.de/patents/US6673695?utm_source=gb-gplus-sharePatent US6673695 - STI scheme to prevent fox recess during pre-CMP HF dip
