The present invention has an object to obtain a small-size, high-temperature and high-pressure treatment device adapted to treat semiconductor wafers. The high-temperature and high-pressure device of the invention is intended to treat semiconductor wafers in an atmosphere of high-temperature and high-pressure...http://www.google.de/patents/US6733592?utm_source=gb-gplus-sharePatent US6733592 - High-temperature and high-pressure treatment device
