A method for producing a component having a semiconductor substrate, in which porous semiconductor material is generated for the purpose of developing at least one thermally decoupled pattern. In the material that has been rendered porous, a recess or a plurality of recesses is/are etched to produce...http://www.google.de/patents/US7803646?utm_source=gb-gplus-sharePatent US7803646 - Method for producing a component having a semiconductor substrate and component
