High throughput systems and processes for recrystallizing thin film semiconductors that have been deposited at low temperatures on a substrate are provided. A thin film semiconductor workpiece is irradiated with a laser beam to melt and recrystallize target areas of the surface exposed to the laser beam....http://www.google.de/patents/US20060040512?utm_source=gb-gplus-sharePatent US20060040512 - Single-shot semiconductor processing system and method having various irradiation patterns
