Methods of forming conformal films that reduce the amount of metal-containing precursor and/or silicon containing precursor materials required are described. The methods increase the amount of film grown following each dose of metal-containing and/or silicon-containing precursors. The methods may involve...http://www.google.de/patents/US7109129?utm_source=gb-gplus-sharePatent US7109129 - Optimal operation of conformal silica deposition reactors
