Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent...http://www.google.de/patents/US20080027545?utm_source=gb-gplus-sharePatent US20080027545 - Interspinous process implants and methods of use