A thin black mask is created using a single mask process. A dielectric layer is deposited over a substrate. An absorber layer is deposited over the dielectric layer and a reflector layer is deposited over the absorber layer. The absorber layer and the reflector layer are patterned using a single mask...http://www.google.de/patents/US20090257105?utm_source=gb-gplus-sharePatent US20090257105 - DEVICE HAVING THIN BLACK MASK AND METHOD OF FABRICATING THE SAME
