Disclosed is a method for improved processing of semiconductor wafers and the like using processing chemicals, particularly hydrofluoric acid (HF) and water mixtures. Homogeneous vapor mixtures are generated from homogeneous liquid phase mixtures which are preferably recirculated, mixed and agitated....http://www.google.de/patents/US5500081?utm_source=gb-gplus-sharePatent US5500081 - Dynamic semiconductor wafer processing using homogeneous chemical vapors
