In order to establish processing techniques capable of making multi-tip probes with sub-micron intervals and provide such microscopic multi-tip probes, there is provided an outermost surface analysis apparatus for semiconductor devices etc. provided with a function for enabling positioning to be performed...http://www.google.de/patents/US6953519?utm_source=gb-gplus-sharePatent US6953519 - Method of manufacturing the multi-tip probe, a multi-tip probe, and surface characteristic analysis apparatus
