In one embodiment, the invention provides a method for fabricating a microelectromechanical systems device. The method comprises fabricating a first layer comprising a film having a characteristic electromechanical response, and a characteristic optical response, wherein the characteristic optical response...http://www.google.de/patents/US7781850?utm_source=gb-gplus-sharePatent US7781850 - Controlling electromechanical behavior of structures within a microelectromechanical systems device
