A novel rapid thermal process (RTP) reactor processes a multiplicity of wafers or a single large wafer, e.g., 200 mm (8 inches), 250 mm (10 inches), 300 mm (12 inches) diameter wafers, using either a single or dual heat source. The wafers or wafer are mounted on a rotatable susceptor supported by a susceptor...http://www.google.de/patents/US6151447?utm_source=gb-gplus-sharePatent US6151447 - Rapid thermal processing apparatus for processing semiconductor wafers
