The invention relates to an apparatus and process for the vaporization of liquid precursors and deposition of a film on a suitable substrate. Particularly contemplated is an apparatus and process for the deposition of a metal-oxide film, such as a barium, strontium, titanium oxide (BST) film, on a silicon...http://www.google.de/patents/US6056823?utm_source=gb-gplus-sharePatent US6056823 - Temperature controlled gas feedthrough
