The invention relates to a film or a layer made of semi-conducting material with low defect density in the thin layer, and a SOI-disk with a thin silicon layer exhibiting low surface roughness, defect density and thickness variations. The invention also relates to a method for producing a film or a layer...http://www.google.de/patents/US7052948?utm_source=gb-gplus-sharePatent US7052948 - Film or layer made of semi-conductive material and method for producing said film or layer
