A deposition station allows atomic layer deposition (ALD) of films onto a substrate. The station comprises an upper and a lower substantially flat part between which a substrate is accommodated. The parts are positioned opposite each other and parallel to the substrate during processing. At least one...http://www.google.de/patents/US7754013?utm_source=gb-gplus-sharePatent US7754013 - Apparatus and method for atomic layer deposition on substrates
