The present method provides tools for growing conformal metal nitride, metal carbide and metal thin films, and nanolaminate structures incorporating these films, from aggressive chemicals. The amount of corrosive chemical compounds, such as hydrogen halides, is reduced during the deposition of transition...http://www.google.de/patents/US20050106877?utm_source=gb-gplus-sharePatent US20050106877 - Method for depositing nanolaminate thin films on sensitive surfaces
