There are disclosed resist developers in which additives selected from certain tetraalkylammonium or phosphonium cations, benzyltrialkylammonium or phosphonium cations, and benzyltriphenylammonium or phosphonium cations, are effective in enhancing the developer selectivity....http://www.google.de/patents/US4423138?utm_source=gb-gplus-sharePatent US4423138 - Resist developer with ammonium or phosphonium compound and method of use to develop o-quinone diazide and novolac resist
