An apparatus comprising a mask having an active device area and a moat. The moat substantially surrounds the mask active device area and has a width greater than a plasma specie diffusional length. A method comprising depositing a layer of resist on a mask substrate having transparent and opaque layers;...http://www.google.de/patents/US6485869?utm_source=gb-gplus-sharePatent US6485869 - Photomask frame modification to eliminate process induced critical dimension control variation
