High density oxide films are deposited by a pulsed-DC, biased, reactive sputtering process from a titanium containing target to form high quality titanium containing oxide films. A method of forming a titanium based layer or film according to the present invention includes depositing a layer of titanium...http://www.google.de/patents/US8076005?utm_source=gb-gplus-sharePatent US8076005 - Energy conversion and storage films and devices by physical vapor deposition of titanium and titanium oxides and sub-oxides
Energy conversion and storage films and devices by physical vapor deposition ...