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US006853441B2
(12) United States Patent ao) Patent No.: us 6,853,441 B2
Kobayashi et al. (45) Date of Patent: Feb. 8,2005
(54) PROJECTION ALIGNER
(75) Inventors: Yoshinori Kobayashi, Tokyo (JP);
Shigetomo Ishibashi, Tokyo (JP);
Masato Hara, Toyko (JP)
(73) Assignee: PENTAX Corporation, Tokyo (JP)
( * ) Notice: Subject to any disclaimer, the term ol this patent is extended or adjusted under 35 U.S.C. 154(b) by 0 days.
(21) Appl. No.: 10/327,946
(22) Filed: Dec. 26, 2002
(65) Prior Publication Data
US 2003/0117603 Al Jun. 26, 2003
(30) Foreign Application Priority Data
Dec. 26, 2001 (JP) 2001-394058
Jan. 11, 2002 (JP) 2002-005392
(51) Int. CI.7 G03B 27/42; G03B 27/52;
G03B 27/54; G03B 27/70
(52) U.S. CI 355/55; 355/53; 355/60;
355/66; 355/67
(58) Field of Search 355/53, 55, 60,
355/66, 67; 356/401
The projection aligner translers a mask pattern formed on a mask to a substrate. A collimated light beam is emitted from a light source toward the mask. The light beam passed through the mask is deflected by a first mirror formed on a deflector toward a lens unit having a positive power. A reflector is provided at the other side ol the lens unit to reflect back the light beam passed through the lens unit. The light beam reflected by the reflector passed through the lend unit again and then deflected by a second mirror formed on the deflector toward the substrate to form an image ol the mask pattern. The size ol the image formed on the substrate is adjusted by moving the reflector along the optical axis ol the lens unit, and the deflector along the optical path ol the light beam passed through the mask.
13 Claims, 10 Drawing Sheets
