Method and apparatus for measuring alignment of layers in photolithographic ...

IIIIIIIH

US007349105B2

(12) United States Patent

Weiss

(io) Patent No.: (45) Date of Patent:

US 7,349,105 B2 Mar. 25, 2008

(54) METHOD AND APPARATUS FOR

MEASURING ALIGNMENT OF LAYERS IN
PHOTOLITHOGRAPHIC PROCESSES

(75) Inventor: Martin Weiss, Portland, OR (US)

(73) Assignee: Intel Corporation, Santa Clara, CA (US)

( * ) Notice: Subject to any disclaimer, the term of this patent is extended or adjusted under 35 U.S.C. 154(b) by 450 days.

(21) Appl. No.: 10/932,657

(22) Filed: Sep. 1, 2004

(65) Prior Publication Data

US 2006/0044568 Al Mar. 2, 2006

(51) Int. CI.

G01B 11/14 (2006.01)
G01B 11/02 (2006.01)

(52) U.S. CI 356/620; 356/401; 356/508

(58) Field of Classification Search None

See application file for complete search history.

(56) References Cited

U.S. PATENT DOCUMENTS

5,216,257 A * 6/1993 Braeck et al 250/548

5,414,514 A * 5/1995 Smith et al 356/509

5,808,742 A * 9/1998 Everett et al 356/509

6,061,606 A * 5/2000 Ross 700/121

2002/0080364 Al * 6/2002 Monshouwer et al 356/508

OTHER PUBLICATIONS

Adel, Mike, et al. "Optimized Overlay Metrology Marks: Theory and Experiment", IEEE Transactions on Semiconductor Manufacturing, vol. 17, No. 2, May 2004. pp. 166-179.

Amidror, Isaac, "The Fourier-spectrum of Circular Sine and Cosine Gratings With Arbitrary Radial Phases", Apr. 1, 1998, Optics Communications 149 (1998), Elsevier Science B.V. pp. 127-134. Glassner, Andrew, "Andrew Glassner's Notebook: Inside Moire Patterns", IEEE Computer Graphics and Applications, Nov./Dec. 1997, pp. 97-101.

Huang, Hsu-Ting, et al., "Scatterometry—Based Overlay Metrology", Metrology, Inspection, and Process Control for Microlifhography Xvii, Proceedings of SPIE, vol. 5038 (2003). pp. 126-137.

Kanjilal, A.K., et al., "Automatic Mask Alignment Without A Microscope", IMTC '94, May 10-12, Hamamatsu, THAM 1-9. pp. 849-852.

Liu, Jing-Nan, et al., "Precision Alignment of Pulse Stage Using Moire Signals", SICE Aug. 5-7, 2002, Osaka SICE02-0583 MA165. pp. 382-385.

Liou, N.-S., et al., "Fourier Transform Moire Strain Analysis By Using Cross Gratings Produced From Iron-on Paper and Inkjet Printer", Science Direct, Polymer Testing 22 (2003) 487-490. 2003 Published by Elsevier Science Ltd. pp. 487-490.

(Continued)

Primary Examiner—Layla G. Lauchman

Assistant Examiner—Jonathan Skovholt

(74) Attorney, Agent, or Firm—Blakely, Sokoloff, Taylor &

Zafman LLP

OTHER PUBLICATIONS

Nishihara, H. Keith, et al., "Measuring Photolithographic Overlay Accuracy and Critical Dimensions by Correlating Binarized Laplacian of Gaussian Convolutions", IEEE Transactions on Pattern Analysis and Machine Intelligence, vol. 10, No. 1, Jan. 1988. pp. 17-30.

Patorski, K., et al., "Optical Alignment Using Fourier Imaging Phenomenon and Moire Technique", Optics and Laser Technology, Apr. 1975. pp. 81-85.

Wang, Boxiong, et al., "Moire Deflectometry Based On Fourier—Transform Analysis", Elsevier Science Ltd. 1999. Measurement 25 (1999) pp. 249-253.

Wang, Ming, "Fourier Transform Moire Tomography For High—Sensitivity Mapping Asymmetric 3—D Temperature Field", 2002 Elsevier Science Ltd., Optics & Laser Technology 34 (2002) pp. 679-685.

* cited by examiner