United States Patent [193 [11] Patent Number: 4,541,001
Schutten et al. [45] Date of Patent: Sep. 10, 1985
[54] BIDIRECTIONAL POWER FET WITH SUBSTRATE-REFERENCED SHIELD
[75] Inventors: Herman P. Schutten, Milwaukee;
James A. Benjamin, Waukesha, both of Wis.; Robert W. Lade, Fort Myers, Fla.
[73] Assignee: Eaton Corporation, Cleveland, Ohio [21] Appl. No.: 421,933 [22] Filed: Sep. 23, 1982
[51] Int. C1.3 H01L 29/78; H01L 29/06;
H01L 29/40
[52] U.S. CI 357/23.4; 357/55;
357/53; 357/23.14; 357/41
[58] Field of Search 357/23 HV, 23 VD, 23 MG,
357/39, 41, 47, 53, 55
[56] References Cited
U.S. PATENT DOCUMENTS
2,994,811 8/1961 Senitzky 357/55
3,629,667 12/1971 Lubart et al 357/39
4,163,988 8/1979 Yeh et al 357/23 VD
4,199,774 4/1980 Plummer 357/41
4,219,835 8/1980 Van Loon 357/53
4,243,997 1/1981 Natori et al 357/22
4,300,150 11/1981 Colak 357/52
4.364.073 12/1982 Becke et al 357/23 VD
4.364.074 12/1982 Garnache et al 357/41
4,414,560 11/1983 Lidow 357/39
4,455,740 6/1984 Iwai 29/571
4,470,062 9/1984 Muramatsu 357/55
FOREIGN PATENT DOCUMENTS
0073585 6/1979 Japan 357/39
2089118 6/1982 United Kingdom 357/23 MG
OTHER PUBLICATIONS
P. Ou-Yang, "Double Ion-Implantation V-MOS Tech.," J. of S-S Ckts., vol. SC-12 #1, Feb. 1977, pp. 3-10.
H. Lee et al., "Short-Channel Field-Effect Transistors