Illllllllllllllllllllllllllllllllllllllllllllllllllll
US007009753B2
(12) United States Patent ao) Patent No.: us 7,009,753 B2
Sandstrom (45) Date of Patent: Mar. 7,2006
(54) PATTERN GENERATOR
(75) Inventor: Torbjorn Sandstrom, Pixbo (SE)
(73) Assignee: Micronic Laser Systems AB, Taby (SE)
( * ) Notice: Subject to any disclaimer, the term ol this patent is extended or adjusted under 35 U.S.C. 154(b) by 0 days.
(21) Appl. No.: 10/776,192
(22) Filed: Feb. 12, 2004
(65) Prior Publication Data
US 2004/0165170 Al Aug. 26, 2004
Related U.S. Application Data
(63) Continuation of application No. 09/623,195, filed on Aug. 29, 2000, now Pat. No. 6,747,783, which is a continuation of application No. PCT/SE99/00310, filed on Mar. 2, 1999.
(30) Foreign Application Priority Data
Mar. 2, 1998 (SE) 9800665
(51) Int. CI.
G02B 26/00 (2006.01)
G03B 27/42 (2006.01)
G03C 5/00 (2006.01)
(52) U.S. CI 359/291; 355/53; 430/30
(58) Field of Classification Search 359/223,
359/290, 291, 295, 298; 250/396 R, 491.1, 250/492.2; 430/5, 22, 30, 311, 394-396;
355/52, 53, 55, 67, 69, 401, 402 See application file for complete search history.
(56) References Cited
5,148,157 A 9/1992 Florence 345/84
5,171,965 A * 12/1992 Suzuki et al 219/121.6
5,296,891 A 3/1994 Vogt et al 355/67
5,497,258 A * 3/1996 Ju et al 349/58
5,504,504 A 4/1996 Markandey et al 345/214
5,508,841 A 4/1996 Lin et al 359/318
5,523,193 A * 6/1996 Nelson 430/311
5,539,567 A 7/1996 Lin et al 359/281
(Continued)
FOREIGN PATENT DOCUMENTS
EP 0 467 076 1/1992
(Continued)
OTHER PUBLICATIONS
H. Kuck et al., New System for fast submicron laser direct writing, SPIE vol. 2440, pp. 506-514.
(Continued)
Primary Examiner—Georgia Epps
Assistant Examiner—William Choi
(74) Attorney, Agent, or Firm—Harness, Dickey & Pierce, PL.C.
![[blocks in formation]](http://www.google.de/patents?id=3M53AAAAEBAJ&hl=de&ie=ISO-8859-1&output=text&pg=PA1&img=1&zoom=3&hl=de&q=&cds=1&sig=ACfU3U0RC6gO9jTwC7XgzYtWVB9X0Rmx5A&edge=0&edge=stretch&ci=487,606,259,18)
![[blocks in formation]](http://www.google.de/patents?id=3M53AAAAEBAJ&hl=de&ie=ISO-8859-1&output=text&pg=PA1&img=1&zoom=3&hl=de&q=&cds=1&sig=ACfU3U0RC6gO9jTwC7XgzYtWVB9X0Rmx5A&edge=0&edge=stretch&ci=128,881,382,32)
The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus may include a source for emitting light flashes, a spatial modulator having modulating elements (pixels), adapted to being illuminated by the radiation, and a projection system creating an image of the modulator on the workpiece. It may further include an electronic data processing and delivery system receiving a digital description of the pattern to be written, converting the pattern to modulator signals, and feeding the signals to the modulator. An electronic control system may be provided to control a trigger signal to compensate for flash-to-flash time jitter in the light source.
23 Claims, 8 Drawing Sheets
