IIIH
US007085698B2
(12) United States Patent ao) Patent No.: Us 7,085,698 B2
Tsai et al. (45) Date of Patent: Aug. 1,2006
Page 2
(54) METHOD FOR PROVIDING FLEXIBLE AND DYNAMIC REPORTING CAPABILITY USING SIMULATION TOOLS
(75) Inventors: Chi-Ming Tsai, Palo Alto, CA (US);
Shao-Po Wu, Portola Valley, CA (US)
(73) Assignee: Synopsys, Inc., Mountain View, CA (US)
( * ) Notice: Subject to any disclaimer, the term of this patent is extended or adjusted under 35 U.S.C. 154(b) by 738 days.
(21) Appl. No.: 10/025,414
(22) Filed: Dec. 18, 2001
(65) Prior Publication Data
US 2003/0115034 Al Jun. 19, 2003
(51) Int. CI.
G06F17/50 (2006.01)
(52) U.S. CI 703/13; 703/14; 703/1;
716/9; 716/10
(58) Field of Classification Search 703/14,
703/15; 716/11, 9, 10 See application file for complete search history.
(56) References Cited
U.S. PATENT DOCUMENTS
5,694,481 A * 12/1997 Lam et al 382/145
5,801,954 A 9/1998 Le et al 364/488
5.838.583 A * 11/1998 Varadarajan et al 716/9
5,974,243 A 10/1999 Moh et al 395/500.03
6.045.584 A 4/2000 Benzel et al 716/11
6,077,307 A 6/2000 Benzel et al 716/2
6,081,659 A 6/2000 Garza et al 395/500.22
6,115,546 A * 9/2000 Chevallier et al 716/5
6,263,301 Bl * 7/2001 Cox et al 703/14
6,301,689 Bl * 10/2001 Darden 716/5
6,370,679 Bl * 4/2002 Chang et al 716/19
6,415,421 Bl* 7/2002 Anderson et al 716/4
6,425,113 Bl* 7/2002 Anderson et al 716/4
6,467,076 Bl* 10/2002 Cobb 716/19
6,470,489 Bl * 10/2002 Chang et al 716/21
6,523,162 Bl * 2/2003 Agrawal et al 716/19
6,560,766 Bl * 5/2003 Pierrat et al 716/19
6,578,188 Bl * 6/2003 Pang et al 716/19
6,584,609 Bl * 6/2003 Pierrat et al 716/19
6,637,013 Bl* 10/2003 Li 716/5
6,757,645 Bl * 6/2004 Chang et al 703/13
2003/0061583 Al * 3/2003 Malhotra 716/5
FOREIGN PATENT DOCUMENTS
WO WO 99/14638 Al 3/1999
WO WO 00/67075 Al 11/2000
WO WO 00/67076 Al 11/2000
OTHER PUBLICATIONS
Lavenir, "Lavenir CAM Software User's Guide", 1999, pp. 115-130, 385-412.*
A.B. Kahng and Y.C. Pati, "Subwavelength Optical Lithography: Challenges and Impact on Physical Design", 1999, ACM, pp. 112-119.*
(Continued)
Primary Examiner—Paul L. Rodriguez
Assistant Examiner—Jason Proctor
(74) Attorney, Agent, or Firm—Bever Hoffman & Harms, LLP; Jeanette S. Harms
OTHER PUBLICATIONS
E. Sahouria, Y. Granik, N. Cobb, and O. Toublan; "Full-chip Process Simulation for Silicon DRC"; 2000, MSM 2000, pp. 1-4.*
Frank M Schellenberg, "Resolution Enhancement with OPC/PSM", Jan. 2000, pp. 1-16.*
Cai, L., et al., "Enhanced Dispositioning of Reticle Defects Using the Virtual Stepper with Automated Defect Severity Scoring", Numerical Technologies, Inc., Advanced Micro Devices. Inc., pp. 1-12.
Ronsc. K., et al., "Thin Film Interference Effects in Phase
Shifting Masks Causing Phase and Transmittance Errors",
IMEC (15 pages).
Casey, Jr., J.D., et al., "Chemically Enhanced FIB Repair of
Opaque Defects on Molybdenum Silicide Photomasks",
SPIE, vol. 3236, pp. 487-497 (1997).
Henke, W., et al., "A Study of Reticle Defects Imaged Into
Three-Dimensional Developed Profiles of Positive
Photoresist Using the Solid Lithography Simulator", Micro-
electronics Eng., vol. 14, pp. 283-297 (1991).
Ham, Y.M., et al., "Dependence of Defects in Optical
Lithography", Jpn. J. Appl. Phys., vol. 31, pp. 4137-4142
(1992).
Watanabe, H., et al., "Detection and Printability of Shifter
Defects in Phase-Shifting Masks II Defocus Characteris-
tics", Jpn. J. Appl. Phys., vol. 31, pp. 4155-4160 (1992).
Nistler, J., et al., "Phase Shift Mask Defect Printability
Analysis", Proceedings Of The Microlithography Seminar
INTERFACE '93. OCG Microelectronic Materials, Inc., pp. 11-28 (1993).
Spence, C, et al., "Automated Determination of CAD Layout Failures Through Focus: Experiment and Simulation", SPIE, vol. 2197, pp. 302-313 (1994). Karklin, L., "A Comprehensive Simulation Study of the Photomask Defects Printability", SPIE, vol. 2621. pp. 490504 (1995).
Gans, F., et al., "Printability and Repair Techniques for DUV Photomasks", SPIE, Proceedings Of The 17th Annual Symposium On Photomask Technology And Management, vol. 3236. pp. 136-141 (1997).
Ibsen, K., et al., "Clear Field Reticle Defect Diposition for Advanced Sub-Half Micron Lithography", SPIE, Proceedings Of The 17th Annual Symposium on Photomask Technology And Management, vol. 3236, pp. 124-135 (1997). Tsujimoto, E., et al., "Hierarchical Mask Data Design System (PROPHET) for Aerial Image Simulation, Automatic Phase-Shifter Placement, and Subpeak Overlap Checking", SPIE, vol. 3096, pp. 163-172 (1997). Gordon, R., et al., "Design and Analysis of Manufacturable Alternating Phase-Shifting Masks", Bacus News, vol. 14, Issue 12, pp. 1-9, Dec. 1998.
Chen, et al., "ArF (193nm) Alternating PSM Quartz Defect Repair and Printability for lOOnm Node", BACUS Photomask Technology, Sep. 21, 2001 (20 pages).
* cited by examiner
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