US 7,305,651 B2 Dec. 4, 2007
(54) MASK CD CORRECTION BASED ON GLOBAL PATTERN DENSITY
(75) Inventor: Min Cao, Hsin-Chu (TW)
(73) Assignee: Taiwan Semiconductor
Manufacturing Company, Ltd.,
Hsin-Chu (TW)
( * ) Notice: Subject to any disclaimer, the term of this patent is extended or adjusted under 35 U.S.C. 154(b) by 341 days.
(21) Appl. No.: 11/155,159
(22) Filed: Jun. 17, 2005
(65) Prior Publication Data
US 2006/0286690 Al Dec. 21, 2006
(51) Int. CI.
G06F17/50 (2006.01)
(52) U.S. CI 716/19; 716/20
(58) Field of Classification Search 716/19,
716/21; 438/14 See application file for complete search history.
(56) References Cited
U.S. PATENT DOCUMENTS
5,740,068 A * 4/1998 Liebmann et al 716/21
