(54) SYSTEM FOR REAL-TIME CONTROL OF SEMICONDUCTOR WAFER POLISHING
(75) Inventors: Gurtej S. Sandhu; Trung Tri Doan,
both of Boise, ID (US)
(73) Assignee: Micron Technology, Inc., Boise, ID (US)
( * ) Notice: Subject to any disclaimer, the term of this patent is extended or adjusted under 35 U.S.C. 154(b) by 0 days.
(21) Appl. No.: 09/898,384
(22) Filed: Jul. 3, 2001
(65) Prior Publication Data
US 2001/0041501 Al Nov. 15, 2001
Related U.S. Application Data
(60) Division of application No. 09/752,217, filed on Dec. 28, 2000, now Pat. No. 6,338,667, which is a division of application No. 09/501,735, filed on Feb. 11, 2000, now Pat. No. 6,261,151, which is a division of application No. 09/181,433, filed on Oct. 28, 1998, now Pat. No. 6,120,347, which is a continuation of application No. 08/907,389, filed on Aug. 7, 1997, now Pat. No. 5,851,135, which is a continuation of application No. 08/547,529, filed on Oct. 24, 1995, now Pat. No. 5,700,180, which is a continuation-inpart of application No. 08/112,759, filed on Aug. 25, 1993, now Pat. No. 5,486,129.
(51) Int. CI.7 B24B 49/00; B24B 51/00
(52) U.S. CI 451/5; 451/7; 451/8; 451/9
(58) Field of Search 451/5, 8, 9, 10,
451/53, 7, 286-290, 449
(56) References Cited
U.S. PATENT DOCUMENTS
