TFT fabrication equipment including a first chamber for processing under oxidizing atmosphere, a second chamber for processing under reducing atmosphere, a third chamber for performing crystallization, a fourth chamber for load-locking, and a fifth chamber. A substrate is transferred from any one chamber...http://www.google.de/patents/US6673126?utm_source=gb-gplus-sharePatent US6673126 - Multiple chamber fabrication equipment for thin film transistors in a display or electronic device
Multiple chamber fabrication equipment for thin film transistors in a ...
