Electronic grade hydrofluoric acid
Molecular formula: HF
Product Introduction:

With international advanced technology and equipment, the current production capacity is 6,000 tons/year. The quality remains stable at the G5 level, and it is widely used in the manufacturing of storage, logic, and automotive power semiconductor chips. Our products have successfully achieved domestic substitution of similar products at home and abroad, breaking the long-standing monopoly of high-quality electronic chemicals by foreign countries.

Product details

Product Introduction
With international advanced technology and equipment, the current production capacity is 6,000 tons/year. The quality remains stable at the G5 level, and it is widely used in the manufacturing of storage, logic, and automotive power semiconductor chips. Our products have successfully achieved domestic substitution of similar products at home and abroad, breaking the long-standing monopoly of high-quality electronic chemicals by foreign countries. Electronic grade hydrofluoric acid is one of the key basic chemical materials in the microelectronics industry, and is a type of wet electronic chemicals. Due to the significant impact of the purity and cleanliness of electronic grade hydrofluoric acid on the yield, performance, and reliability of integrated circuits, the production process and technology requirements are high. Currently, it mainly relies on imported products to meet the domestic market demand. In the field of wet electronic chemicals, the internationally recognized wet electronic chemical quality standard is the SEMI international standard, which is divided into five levels, with G5 being the highest level. The product grade of electronic grade hydrofluoric acid manufacturers in China is generally low, with only about three enterprises, including our company, capable of achieving G4 grade or above for semiconductor use. The other two are DFD Chem and Grandit. And the localization rate of high-end electronic grade hydrofluoric acid is low.


Main uses
In the semiconductor field, it is mainly used for wafer surface cleaning, cleaning and etching during chip processing, and other processes; In the field of new displays, it is mainly used for glass substrate cleaning, silicon nitride, silicon dioxide etching, etc; In the field of photovoltaic solar cells, it is mainly used for surface cleaning, etching edge removal, cleaning and velvet making of silicon wafers.

 

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